| 摘要 |
Treatment of substrates made of insulating materials in high-frequency plasmas involves production of a thin electrically-conductive surface layer and using this layer as a high-frequency discharge electrode. A thin electrically conductive layer is produced on the substrate surface (4, 4') to be treated, and this layer is used as a high-frequency discharge electrode to which power is supplied by means of a coupling electrode lying closely against the other side of the substrate. The claimed apparatus includes a vacuum chamber (1), a holding unit for the substrate (2, 2'), and a high-frequency generator (3) connected to a coupling electrode (7, 7) which is attached to the holding unit so that it closely lies against the substrate surface facing away from the surface to be treated. The apparatus is used to produce coatings on substrates by a physical vacuum coating process.
|
