LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM

摘要

PURPOSE: A liquid treatment apparatus and method, and storage media are provided to prevent yield drop due to the generation of a watermark by supplying washing solution to a processing liquid nozzle and eliminating attachment of the processing liquid nozzle. CONSTITUTION: A processing liquid nozzle supplies processing liquid to a substrate. The processing liquid nozzle is placed in a standby part(66). A transfer means transfers the processing liquid nozzle between the upper side of a liquid treatment part and the standby part. A washing solution supplying means supplies washing solution to the processing liquid nozzle. A liquid delete part(101) contacts to droplet of the washing solution and eliminates the droplet from the processing liquid nozzle. The liquid delete part comprises a corn-shaped part(102) and liquid exhausting part(103).