Growing Silicon by Plasma Enhanced Chemical Vapour Deposition,申请号GB20100013979-传众专利搜索

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发明名称	Growing Silicon by Plasma Enhanced Chemical Vapour Deposition
摘要
申请公布号	GB2482915(A)	申请公布日期	2012.02.22
申请号	GB20100013979	申请日期	2010.08.20
申请人	DE MONTFORT UNIVERSITY	发明人	SHASHI PAUL
分类号	H01L21/02;C01B33/029;C23C18/08;C23C20/04;C30B25/00;H01L27/146;H01L29/06	主分类号	H01L21/02
代理机构		代理人
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