发明名称 |
Performance-aware logic operations for generating masks |
摘要 |
A method for forming masks for manufacturing a circuit includes providing a design of the circuit, wherein the circuit comprises a device; performing a first logic operation to determine a first region for forming a first feature of the device; and performing a second logic operation to expand the first feature to a second region greater than the first region. The pattern of the second region may be used to form the masks. |
申请公布号 |
US8122394(B2) |
申请公布日期 |
2012.02.21 |
申请号 |
US20080212088 |
申请日期 |
2008.09.17 |
申请人 |
LU LEE-CHUNG;LIN CHUNG-TE;WANG YEN-SEN;CHUANG YAO-JEN;CHANG GWAN SIN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LU LEE-CHUNG;LIN CHUNG-TE;WANG YEN-SEN;CHUANG YAO-JEN;CHANG GWAN SIN |
分类号 |
G06F17/50;G06F7/66;G06K9/00;H01L21/66 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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