发明名称 SAMPLE INSPECTION DEVICE AND ABSORPTION CURRENT IMAGE CREATION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a technology which emphasizes the change in an absorption current obtained from failure spots included in a wiring section to be inspected in relation to the other wiring sections. <P>SOLUTION: A sample inspection device for outputting absorption current images 13 and 15 by interlocking an absorption current output from two probes 4 into scanning an electron beam 1 at the time of scanning an electron beam adopts the following configuration. When the electron beam is irradiated to a failure spot of wiring sections on the side of a sample 2 electrically connected by the two probes 4, the change in the resistance value is bigger than when the electron beam is irradiated on normal wiring sections. The change in the resistance value is detected as a change of the ratio of the wiring sections to be specified by the two probes 4 and the known resistance value. By this method, the absorption current image 15 corresponding to the failure spot can be easily identified in relation to the absorption current image 13 of the other wiring sections. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012033604(A) 申请公布日期 2012.02.16
申请号 JP20100170371 申请日期 2010.07.29
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 OBUKI TOMOHARU;NAKAMURA MITSUHIRO;NARA YASUHIKO;ANDO TORU
分类号 H01L21/66;H01J37/28 主分类号 H01L21/66
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