发明名称 |
METHOD, DEVICE, AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE |
摘要 |
A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by using different dosages, and where the size ranges for the two characters is continuous. A method for forming circular patterns on a surface using variable-shaped beam (VSB) shots of different dosages is also disclosed. A method for forming circular patterns on a surface using a set of shots, where all of the shots comprise dosages, is also disclosed.
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申请公布号 |
US2012040279(A1) |
申请公布日期 |
2012.02.16 |
申请号 |
US201113282446 |
申请日期 |
2011.10.26 |
申请人 |
FUJIMURA AKIRA;TUCKER MICHAEL;D2S, INC. |
发明人 |
FUJIMURA AKIRA;TUCKER MICHAEL |
分类号 |
G03F1/78;B41C1/14;G06F17/50;G21K5/00 |
主分类号 |
G03F1/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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