| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or a radiation-sensitive resin composition which simultaneously satisfies high sensitivity, high resolution, excellent roughness characteristics and the reduction of development defects, and a resist film and pattern forming method using the resin composition. <P>SOLUTION: An actinic ray-sensitive or a radiation-sensitive resin composition includes a resin (P) including a repeating unit (A) which decomposes under exposure to an actinic ray or radiation so as to generate acid and a repeating unit (B) which has a structure that solubility in an alkali developer is increased by decomposing due to the action of the acid, and a compound (U) which is constituted to be unevenly distributed on the surface of a film when the film is formed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
