发明名称 INTENSITY SELECTIVE EXPOSURE PHOTOMASK
摘要 An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage.
申请公布号 US2012040278(A1) 申请公布日期 2012.02.16
申请号 US201113281198 申请日期 2011.10.25
申请人 LIU GEORGE;CHEN KUEI SHUN;YEH CHIH-YANG;HUANG TE-CHIH;LIU WEN-HAO;CHENG YING-CHOU;LUO BOREN;OU TSONG-HUA;TANG YU-PO;HUANG WEN-CHUN;LIU RU-GUN;LU SHU-CHEN;LIU YU LUN;KU YAO-CHING;GAU TSAI-SHENG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.,("TSMC") 发明人 LIU GEORGE;CHEN KUEI SHUN;YEH CHIH-YANG;HUANG TE-CHIH;LIU WEN-HAO;CHENG YING-CHOU;LUO BOREN;OU TSONG-HUA;TANG YU-PO;HUANG WEN-CHUN;LIU RU-GUN;LU SHU-CHEN;LIU YU LUN;KU YAO-CHING;GAU TSAI-SHENG
分类号 G03F1/38 主分类号 G03F1/38
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