| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and liquid for preventing oxidation, suppressing or preventing a metallic film surface on a semiconductor substrate from being corroded (eroded) due to oxidation, and also to provide a method and liquid for preventing oxidation, with which corrosion of a metallic film and an insulating layer is suppressed applying an antioxidation liquid and an excellent metallic film surface can be maintained utilizing the antioxidant effect, in particular, reducing the effect of water provided in large quantities in a dicing process. <P>SOLUTION: When a metallic film surface on a semiconductor substrate is treated using an antioxidation liquid, a method for preventing oxidation on the metallic film surface uses a liquid comprising water added with at least a phosphorus-containing compound and a basic compound and adjusted to have a pH of 6-10 as the antioxidation liquid. <P>COPYRIGHT: (C)2012,JPO&INPIT |
