发明名称 |
DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To solve such a problem that in a method for mounting a contact sensor on a head tip part and detecting a defect by contact with the defect, the defect may be dragged and a wafer surface may be damaged by the defect in the defect detection. <P>SOLUTION: A method for detecting a defect on the surface of a sample includes: a pre-scanning defect inspection process including a pre-scanning irradiation step for irradiating the surface of the sample with illuminating light, a pre-scanning detection step for detecting scattered light and a pre-scanning defect information collection step for obtaining information of a predetermined defect existing on the surface of the sample based on the scattered light; a near-field defect inspection process including a near-field irradiation step for adjusting a distance between the surface of the sample and a near-field head and irradiating the surface of the sample with light, a near-field detection step for detecting near-field light response and a near-field defect information collection step for obtaining information of the predetermined defect based on the near-field light; and a merging process for merging the information of the predetermined defect and inspecting the defect existing on the surface of the sample. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012032251(A) |
申请公布日期 |
2012.02.16 |
申请号 |
JP20100171331 |
申请日期 |
2010.07.30 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
NAKAO TOSHIYUKI;XU JUN-GUO;SHIMIZU HIROKI;NAKADA TOSHIHIKO;HONDA TOSHIFUMI;SHIBATA YUKIHIRO;URANO YUTA |
分类号 |
G01N21/956;G01B11/30;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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