发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device, which can simplify a structure for suppressing burrs. <P>SOLUTION: An outer resin portion 5b is arranged so as to surround the outside of an inter resin portion 5a so that the outer resin portion 5b becomes a part of a mold for forming the inner resin portion 5a. The inner resin portion 5a and the outer resin portion 5b are arranged in the same plane at a boundary. In this manufacturing method of a semiconductor device, no space is made in the boundary and occurrence of burrs can be suppressed, and therefore a structure for suppressing burrs can be simplified. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012033793(A) 申请公布日期 2012.02.16
申请号 JP20100173333 申请日期 2010.08.02
申请人 DENSO CORP 发明人 KAJINO YOICHI;ARAI TAKESHI
分类号 H01L21/56 主分类号 H01L21/56
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