发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device, which can achieve high-density packaging while suppressing yield deterioration. <P>SOLUTION: A manufacturing method of a semiconductor device comprises: a first step of preparing a first semiconductor device 110; a second step of coating the front face of a semiconductor element 1b and an interconnection 2 formed on the front face of the semiconductor element 1b with a sealing resin 5b, grinding the front face of the sealing resin 5b to expose the interconnection 2 from the sealing resin 5b, forming a groove 9 extending from the sealing resin 5b to the semiconductor element 1b, and preparing a second semiconductor device 120 formed by grinding the rear face of the semiconductor element 1b; and a third step of mounting the second semiconductor device 120 in a state that the terminal formation face of the second semiconductor device 120 and the terminal formation face of the first semiconductor device 110 face each other. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012033969(A) 申请公布日期 2012.02.16
申请号 JP20110239088 申请日期 2011.10.31
申请人 LAPIS SEMICONDUCTOR CO LTD 发明人 OUCHI NOBUHITO;YAMADA SHIGERU;SHIRAISHI YASUSHI
分类号 H01L25/18 主分类号 H01L25/18
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