发明名称 EXPOSURE APPARATUS
摘要 <p>PURPOSE: An exposing apparatus is provided to increase the productivity of a plurality of cells by simultaneously implementing exposing processes to entire jig on which a plurality of cells is loaded. CONSTITUTION: An exposing apparatus(100) includes a plurality of stage parts(110) and a plurality of optical houses(120). When jigs respectively including a plurality of arrangement markers and a plurality of cell loading parts are loaded on the stage parts, each stage part moves the loaded jigs from first positions to second positions and arranges the jigs based on the arrangement markers. The optical houses are in connection with photo-mask holders. When photo-masks are in connection with the cells, the cells are exposed. The photo-masks are determined by a jig unit and supplies identical exposing patterns to the cells.</p>
申请公布号 KR101110790(B1) 申请公布日期 2012.02.15
申请号 KR20110069804 申请日期 2011.07.14
申请人 OPTIRAY. CO. KR 发明人 KIM, SEONG BONG;OH, YOUNG HAK;LEE, SOON SUP
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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