| 发明名称 |
COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING |
| 摘要 |
Composition comprising a source of metal ions and at least one suppressing agent obtainable by reacting a) an amine compound comprising at least three active amino functional groups with b) a mixture of ethylene oxide and at least one compound selected from C3 and C4 alkylene oxides. |
| 申请公布号 |
EP2417285(A1) |
申请公布日期 |
2012.02.15 |
| 申请号 |
EP20100711897 |
申请日期 |
2010.03.31 |
| 申请人 |
BASF SE |
发明人 |
RÖGER-GÖPFERT, CORNELIA;RAETHER, ROMAN BENEDIKT;EMNET, CHARLOTTE;HAAG, ALEXANDRA;MAYER, DIETER |
| 分类号 |
C25D3/38;C23C18/31;C23C18/32;C25D3/58;C25D7/12;H01L21/288;H01L21/768;H05K3/18;H05K3/24;H05K3/42 |
主分类号 |
C25D3/38 |
| 代理机构 |
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代理人 |
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