发明名称 GAS SUPPLYING APPARATUS OF LOADLOCK CHAMBER
摘要 A gas supplying apparatus of a loadlock chamber is provided to reduce gas supplying time to the load lock chamber by rapidly supplying nitrogen gas having high pressure to the loadlock chamber. Nitrogen gas flows in a nitrogen gas inlet(200). A normal closed valve(210) controls inflow of the nitrogen gas flowed in the nitrogen gas inlet through opening and shutting operations. A base plate(220) is used for flowing in the nitrogen gas supplied from the normal closed valve. A ceramic filter(237) removes a foreign substance and impurity. A gas supplying unit(230) supplies the nitrogen gas to the loadlock chamber. The gas supplying unit includes a coupling unit(231), a first inducing pipe(233), a second inducing pipe(235), and the ceramic filter. The coupling unit is coupled to the base plate. The nitrogen gas passing through the coupling unit flows in the first inducing pipe. The second inducing pipe supplies the nitrogen gas to the loadlock chamber.
申请公布号 KR100663374(B1) 申请公布日期 2006.12.22
申请号 KR20050099874 申请日期 2005.10.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, JIN SUCK
分类号 H01L21/02 主分类号 H01L21/02
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