发明名称 Method for fabricating an organic thin film transistor
摘要 Disclosed herein are a method for fabricating an organic thin film transistor, including treating the surfaces of a gate insulating layer and source/drain electrodes with a self-assembled monolayer (SAM)-forming compound through a one-pot reaction, and an organic thin film transistor fabricated by the method. According to example embodiments, the surface-treatment of the gate insulating layer and the source/drain electrodes may be performed in a single vessel through a single process.
申请公布号 US8114704(B2) 申请公布日期 2012.02.14
申请号 US20090379856 申请日期 2009.03.03
申请人 KIM DO HWAN;MOON HYUN SIK;YOO BYUNG WOOK;LEE SANG YOON;LEE BANG LIN;PARK JEONG IL;JEONG EUN JEONG;SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM DO HWAN;MOON HYUN SIK;YOO BYUNG WOOK;LEE SANG YOON;LEE BANG LIN;PARK JEONG IL;JEONG EUN JEONG
分类号 H01L51/40 主分类号 H01L51/40
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