Method of monitoring a substrate patterning process

摘要

A method for monitoring a substrate patterning process, where at least two electrodes are used to apply a voltage to the substrate to cause a reaction in a portion of the substrate, that includes recording a current driven by said voltage as a function of time and/or as a function of a position of the substrate or a patterning mask. Also disclosed are a device and a computer program product for monitoring the substrate patterning process.