ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

摘要

PURPOSE: An advanced process control system and a method utilizing virtual metrology with a reliance index are provided to overcome problems of manage management delay and the dependence of the VM feedback loop of an R2R control. CONSTITUTION: A processing tool(100) processes a plurality of history workpieces. The processing tool performs a plurality of process runs. An instrumentation tool(110) measures a plurality of sampling workpieces. The instrumentation tool measures a plurality of real measurement values of history measurement data and sampling work pieces. A virtual measurement module supplies a plurality of virtual measurement values of the process runs. A dependence index module generates the dependence index(RI) of the process runs.