| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a target which enables stable sputtering while suppressing abnormal electrical discharge, and is capable of forming a transparent conductive film which can be etched with a phosphoric acid-based etching solution which is an etching solution for a metal or an alloy. <P>SOLUTION: The sputtering target contains indium, tin, zinc and oxygen, and includes a hexagonal layered compound, a spinel structure compound and a bixbyite structure compound. <P>COPYRIGHT: (C)2012,JPO&INPIT |
