发明名称 METHOD OF FORMING METAL OXIDE FILM AND METAL OXIDE FILM
摘要 The present invention provides; a method for forming a metal oxide film which has both a surface irregularity and a predetermined pattern or either and has few unevenness of surface specific resistance, light transmittance and the like, and such the metal oxide film. The method for forming a metal oxide film having both a surface irregularity and a predetermined pattern or either on a substrate, wherein, the method comprises a first process in which a liquid material containing a metal salt is applied on the substrate to form a metal salt film, a second process in which a surface irregularity or a predetermined pattern is formed to the metal salt film, and a third process in which the metal salt film is converted to a metal oxide film by thermal oxidation treatment or plasma oxidation treatment.
申请公布号 US2012034423(A1) 申请公布日期 2012.02.09
申请号 US201013258323 申请日期 2010.03.23
申请人 NAGANAWA SATOSHI;KONDO TAKESHI;LINTEC CORPORATION 发明人 NAGANAWA SATOSHI;KONDO TAKESHI
分类号 B32B3/10;B05D5/12;C23F1/02;H05H1/24 主分类号 B32B3/10
代理机构 代理人
主权项
地址