发明名称 STAMP FOR NANOIMPRINT HAVING PROGRESSED SURFACE AREA AND MANUFACTURING METHOD OF THE SAME
摘要 PURPOSE: A surface area improving nano-imprint stamp and a method for manufacturing the same are provided to minimize pitch sizes and to increase entire surface area by stacking nano-particles. CONSTITUTION: A method for manufacturing a surface area improving nano-imprint stamp includes the following: a plurality of first nano-particles(120) is arranged on a base substrate(110); a first pattern(10) is formed on a part of the base part without the first nano-particles; a plurality of second nano-particles(130) is arranged between the first nano-particles; the first nano-particles are eliminated to locate the second nano-particles on the first pattern; a second pattern(20) is formed on a part of the base substrate without the second nano-particles; and the second nano-particles is eliminated.
申请公布号 KR20120012284(A) 申请公布日期 2012.02.09
申请号 KR20100074347 申请日期 2010.07.30
申请人 LG INNOTEK CO., LTD. 发明人 PARK, HYUNG MIN
分类号 B82B3/00;B29C33/38 主分类号 B82B3/00
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