| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which improves productivity by extending a replacement cycle of a plasma light detection window. <P>SOLUTION: A rotating mechanism is provided in the detection window allowing transmission of an emission spectrum of plasma generated by plasma processing in a vacuum processing chamber. A first position of the detection window, at which the emission spectrum is transmitted, is changed to another second position at which the emission spectrum is transmitted, by rotating the detection window. Therefore, the detection window is efficiently used, and a replacement cycle is extended, whereby productivity is improved. <P>COPYRIGHT: (C)2012,JPO&INPIT |
