| 摘要 |
<p>An immersion lithographic apparatus has adaptations (23,27,28,29,30,31,32) to prevent or reduce bubble formation in one or more gaps (22) in the substrate table by preventing bubbles (24) escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.</p> |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
STREEFKERK, BOB;DONDERS, SJOERD;DE GRAAF, ROELOF;HOOGENDAM, CHRISTIAAN;LEENDERS, MARTINUS;MERTENS, JEROEN;RIEPEN, MICHEL |
