发明名称
摘要 <p>A semiconductor wafer fabrication system that includes at least a track system and a scanner system compensates for deviations from nominal periodicity in the scanner system by dynamically introducing time delays when such deviations are detected. Preferably prior art static wait states are also introduced into the wafer recipe to reduce probability of resource conflicts. The resultant semiconductor wafer fabrication system can enjoy enhanced wafer throughput in that synchronization of wafer flow is maintained, despite such deviations.</p>
申请公布号 JP4869919(B2) 申请公布日期 2012.02.08
申请号 JP20060507151 申请日期 2004.03.12
申请人 发明人
分类号 H01L21/02;G05B19/418;H01L21/00;H01L21/027 主分类号 H01L21/02
代理机构 代理人
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