发明名称 NONVOLATILE SEMICONDUCTOR MEMORY TRANSISTOR AND METHOD FOR MANUFACTURING NONVOLATILE SEMICONDUCTOR MEMORY
摘要 <p>PURPOSE: A non-volatile semiconductor memory transistor and a manufacturing method thereof are provided to form a capacity between a control gate and a floating gate to be larger. CONSTITUTION: An island shaped semiconductor(301) includes a source region(303), a channel region(304), and a drain region(302). A floating gate(306) is formed to surround a circumference of the channel region. A control gate(308a) is formed to surround the circumference of the floating gate. A control gate line(308) is electrically connected to the control gate. A first insulating layer is arranged on the substrate to be placed in a lower part of the floating gate.</p>
申请公布号 KR20120010955(A) 申请公布日期 2012.02.06
申请号 KR20110045565 申请日期 2011.05.16
申请人 UNISANTIS ELECTRONICS SINGAPORE PTE. LTD. 发明人 MASUOKA FUJIO;NAKAMURA HIROKI
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
代理机构 代理人
主权项
地址