发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY TRANSISTOR AND METHOD FOR MANUFACTURING NONVOLATILE SEMICONDUCTOR MEMORY |
摘要 |
<p>PURPOSE: A non-volatile semiconductor memory transistor and a manufacturing method thereof are provided to form a capacity between a control gate and a floating gate to be larger. CONSTITUTION: An island shaped semiconductor(301) includes a source region(303), a channel region(304), and a drain region(302). A floating gate(306) is formed to surround a circumference of the channel region. A control gate(308a) is formed to surround the circumference of the floating gate. A control gate line(308) is electrically connected to the control gate. A first insulating layer is arranged on the substrate to be placed in a lower part of the floating gate.</p> |
申请公布号 |
KR20120010955(A) |
申请公布日期 |
2012.02.06 |
申请号 |
KR20110045565 |
申请日期 |
2011.05.16 |
申请人 |
UNISANTIS ELECTRONICS SINGAPORE PTE. LTD. |
发明人 |
MASUOKA FUJIO;NAKAMURA HIROKI |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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