| 摘要 |
PURPOSE: A semiconductor exhaust gas disposal system using a microwave induced plasma is provided to reduce initial investment and operation costs by processing a toxic gas with microwave and an additive having low energy and low temperature. CONSTITUTION: In a semiconductor exhaust gas disposal system using a microwave induced plasma, a microwave generating unit(120) generates microwave. A plasma reactor(130) chemically decomposes an flowed exhaust gas by using microwave. An additive input part(140) inputs an additive to react with the exhaust gas which is chemically disassembled. A dust collector(150) collects a chemical substance by reacting with the additive. A dust collection fan(160) discharges gas passed through the dust collector to a gas process top.
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