| 摘要 |
Disclosed is a sputtering target for magnetic recording films which contains SiO2, characterized by having a ratio of the intensity of the peak assigned to cristobalite, which is crystallized SiO2, to the background intensity in X-ray diffraction (cristobalite peak intensity/background intensity) of 1.40 or less. The sputtering target for magnetic recording films is inhibited from containing cristobalite, which is causative of particle generation during sputtering. With the target, a reduction in burn-in time is possible. |
