发明名称 |
COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING |
摘要 |
A composition comprising a source of metal ions and at least one suppressing agent obtainable by reacting a) an amine compound comprising active amino functional groups with b) a mixture of ethylene oxide and at least one compound selected from C3 and C4 alkylene oxides, said suppressing agent having a molecular weight Mw of 6000 g/mol or more. |
申请公布号 |
US2012027948(A1) |
申请公布日期 |
2012.02.02 |
申请号 |
US201013259482 |
申请日期 |
2010.03.29 |
申请人 |
ROEGER-GOEPFERT CORNELIA;RAETHER ROMAN BENEDIKT;EMNET CHARLOTTE;HAAG ALEXANDRA;MAYER DIETER;BASF SE |
发明人 |
ROEGER-GOEPFERT CORNELIA;RAETHER ROMAN BENEDIKT;EMNET CHARLOTTE;HAAG ALEXANDRA;MAYER DIETER |
分类号 |
B05D1/18;B05D3/14;C09D1/00 |
主分类号 |
B05D1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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