摘要 |
<P>PROBLEM TO BE SOLVED: To provide a silicon carbide semiconductor device in which contact regions connected to source regions and base regions, can be sufficiently made into contact with a source electrode even when formed finely. <P>SOLUTION: In a silicon carbide semiconductor device, a longitudinal direction of contact holes 12a, that is, a longitudinal direction of contact regions of a source electrode 11 with n<SP POS="POST">+</SP>type source regions 4 and p<SP POS="POST">+</SP>type body layers 5 is made orthogonal to a longitudinal direction of the n<SP POS="POST">+</SP>type source regions 4 and the p<SP POS="POST">+</SP>type body layers 5. This allows a contact width of each of the n<SP POS="POST">+</SP>type source regions 4 and the p<SP POS="POST">+</SP>type body layers 5 to the source electrode 11 to be the same width as the contact holes 12a. This allows the p<SP POS="POST">+</SP>type body layers 5 connected to the n<SP POS="POST">+</SP>type source regions 4 and p<SP POS="POST">+</SP>type base regions 3 to be sufficiently made into contact with the source electrode 11, even when the device is formed finely. <P>COPYRIGHT: (C)2012,JPO&INPIT |