发明名称 |
MANUFACTURING DEVICE FOR NANOIMPRINT MOLD AND MANUFACTURING METHOD FOR NANOIMPRINT MOLD |
摘要 |
<p>Disclosed is a manufacturing device for a nanoimprint mold, wherein said device anodises an aluminium substrate with electrolytic solution, and which is characterised in that at least the material on the surface of a portion which comes into contact with the electrolytic solution is a metal or an alloy thereof having an elution amount of not more than 0.2ppm/cm2 per unit surface of metal when immersed for 450 hours at room temperature in 80mL of electrolytic solution. Also disclosed is a manufacturing method for a nanoimprint mold, said method using the manufacturing device for a nanoimprint mold and carrying out anodising. The disclosed manufacturing method for a nanoimprint mold and disclosed manufacturing device for a nanoimprint mold enable the elution of metal to an electrolytic solution when anodising is carried out to be suppressed.</p> |
申请公布号 |
WO2012014774(A1) |
申请公布日期 |
2012.02.02 |
申请号 |
WO2011JP66554 |
申请日期 |
2011.07.21 |
申请人 |
MITSUBISHI RAYON CO., LTD.;OZAWA SATORU;KAMATA MASATOSHI;KOJIMA KATSUHIRO;MASAKI TOMOHIRO |
发明人 |
OZAWA SATORU;KAMATA MASATOSHI;KOJIMA KATSUHIRO;MASAKI TOMOHIRO |
分类号 |
C25D17/00;B29C33/38;B29C59/02;C25D11/10;C25D17/02;G02B1/11 |
主分类号 |
C25D17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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