APPARATUS FOR CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: A chemical vapor deposition apparatus is provided to improve the deposition quality of a wafer by suppressing the contamination of a chamber unit. CONSTITUTION: A susceptor unit(20) supports the wafer in a chamber unit(10). A gas supply unit(30) supplies reactive gas to the wafer and supplies inactive gas to the chamber unit facing the wafer supported by the susceptor unit. The gas supply unit is extended from the lower side to the upper side of the wafer and is formed in a rotation axis of the susceptor unit.