发明名称 Group III nitride semiconductor element and epitaxial wafer
摘要 A primary surface 23a of a supporting base 23 of a light-emitting diode 21a tilts by an off-angle of 10 degrees or more and less than 80 degrees from the c-plane. A semiconductor stack 25a includes an active layer having an emission peak in a wavelength range from 400 nm to 550 nm. The tilt angle“A”between the (0001) plane (the reference plane SR3 shown in FIG. 5) of the GaN supporting base and the (0001) plane of a buffer layer 33a is 0.05 degree or more and 2 degrees or less. The tilt angle“B”between the (0001) plane of the GaN supporting base (the reference plane SR4 shown in FIG. 5) and the (0001) plane of a well layer 37a is 0.05 degree or more and 2 degrees or less. The tilt angles“A”and“B”are formed in respective directions opposite to each other with reference to the c-plane of the GaN supporting base.
申请公布号 US8107507(B2) 申请公布日期 2012.01.31
申请号 US20100965633 申请日期 2010.12.10
申请人 YOSHIZUMI YUSUKE;ENYA YOHEI;UENO MASAKI;NAKANISHI FUMITAKE;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 YOSHIZUMI YUSUKE;ENYA YOHEI;UENO MASAKI;NAKANISHI FUMITAKE
分类号 H01S5/00;C30B29/38;H01L33/06;H01L33/12;H01L33/16;H01L33/32;H01S5/343 主分类号 H01S5/00
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