MOVABLE GROUND RING FOR A PLASMA PROCESSING CHAMBER

摘要

Abstract Movable Ground Ring for a Plasma Processing ChamberA movable ground ring of a movable substrate support assembly is described. The movable ground ring is configured to fit around and provide an RF return path to a fixed ground ring of the movable substrate support assembly in an adjustable gap capacitively-coupled plasma processing chamber wherein a semiconductor substrate supported in the substrate support assembly undergoes plasma processing.Fig. 4A