发明名称 CELLULE PHOTOVOLTAIQUE COMPRENANT UN FILM MINCE DE PASSIVATION EN OXYDE CRISTALLIN DE SILICIUM ET PROCEDE DE REALISATION
摘要 <p>A heterojunction photovoltaic cell includes at least one crystalline silicon oxide film directly placed onto one of the front or rear faces of a crystalline silicon substrate, between said substrate and a layer of amorphous or microcrystalline silicon. The thin film is intended to enable the passivation of said face of the substrate. The thin film is more particularly obtained by radically oxidizing a surface portion of the substrate, before depositing the layer of amorphous silicon. Moreover, a thin layer of intrinsic or microdoped amorphous silicon can be placed between said think film and the layer of amorphous or microcrystalline silicon.</p>
申请公布号 FR2955702(B1) 申请公布日期 2012.01.27
申请号 FR20100000309 申请日期 2010.01.27
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 MUR PIERRE;MORICEAU HUBERT;RIBEYRON PIERRE JEAN
分类号 H01L31/042;H01L31/0236;H01L31/0745;H01L31/0747;H01L31/20 主分类号 H01L31/042
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