| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique that can suppress the installation area of a processing block and suppress reduction of the operation efficiency of a device. <P>SOLUTION: A coating and developing device has a mode selector for selecting a feeding mode of a subsequent substrate from modes M1 and M2 on the basis of data stored in a storage unit when abnormality of a substrate is detected in an examination based on an examination module. The mode M1 is a mode for specifying a module for which a substrate in a unit block for development processing is processed, and controlling the operation of a feeding mechanism for unit blocks so that a subsequent substrate is fed to a module other than the specified module. The module M2 is a mode for specifying a unit block for development processing for which a substrate is processed, and controlling the operation of a delivery mechanism so that a subsequent substrate is fed to a unit block for development processing other than the specified unit block for development processing. <P>COPYRIGHT: (C)2012,JPO&INPIT |
