PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING FILM, AND APPARATUS AND MEMBER EACH COMPRISING SILICA COATING FILM

摘要

The photosensitive resin composition of the invention comprises component (a): a first siloxane resin obtained by hydrolytic condensation of a first silane compound comprising a compound represented by the following formula (1), component (b): a solvent in which component (a) dissolves, and component (c): an ester of a phenol or alcohol and naphthoquinone diazide sulfonic acid.