<p>A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes.</p>
申请公布号
WO2012012795(A1)
申请公布日期
2012.01.26
申请号
WO2011US45186
申请日期
2011.07.25
申请人
FIRST SOLAR, INC;ALLENIC, ARNOLD;GEORGE, II, STEPHEN, PAUL;JAYARAMAN, SREENIVAS;KARPENKO, OLEH;LIM, CHONG
发明人
ALLENIC, ARNOLD;GEORGE, II, STEPHEN, PAUL;JAYARAMAN, SREENIVAS;KARPENKO, OLEH;LIM, CHONG
