| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel structure capable of efficiently exhibiting fungus resistance and mildew resistance with an excellent design. <P>SOLUTION: A structure comprises: a fungusproof and mildewproof layer on a substrate; and a pattern layer on the fungusproof and mildewproof layer. The fungusproof and mildewproof layer contains a fungusproofing and mildewproofing agent. Essential components of the pattern layer comprise: a synthetic resin (A) constituting a coat having a reflection region with a reflectance of 10% or more in a wavelength range from 300 to 500 nm; a colored aggregate (B) having an average particle diameter from 0.01 to 5 mm; a moisture conditioning powder (C); and a photocatalytic metal oxide (D) exhibiting a photocatalytic action in the reflection region. <P>COPYRIGHT: (C)2012,JPO&INPIT |
