发明名称 LOW-TEMPERATURE FORMING METHOD OF GRAPHENE, AND DIRECT TRANSFER OF GRAPHENE AND GRAPHENE SHEET USING THE SAME
摘要 PURPOSE: A low-temperature-based graphene manufacturing method, a direct graphene transferring method using the same, and a graphene sheet are provided to easily manufacture large sized-graphene at a low temperature lower than 500 degrees Celsius based on the inductively coupled plasma-chemical vapor deposition. CONSTITUTION: A substrate is loaded into an inductively coupled plasma-chemical vapor deposition chamber(15) using a loading-locking chamber. A carbon source is supplied into the chamber. Graphene is formed at a temperature lower than 500 degrees Celsius based on the inductively coupled plasma-chemical vapor deposition. The substrate further includes a graphene growing metal catalyst layer. The formation of the graphene is implemented on the upper side of the graphene growing metal catalyst layer based on a roll-to-roll process. The graphene growing metal catalyst layer is eliminated to directly transfer the graphene on the substrate.
申请公布号 KR20120007998(A) 申请公布日期 2012.01.25
申请号 KR20110070262 申请日期 2011.07.15
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION;SAMSUNG TECHWIN CO., LTD. 发明人 HONG, BYUNG HEE;AHN, JONG HYUN;YOO, JI BEOM;BAE, SU KANG;JUNG, MYUNG HEE;JANG, HO UK;LEE, YOUNG BIN;KIM, SANG JIN
分类号 C01B31/02;C23C16/26;C23C16/50 主分类号 C01B31/02
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