System for sputtering and method thereof,申请号KR20100042117-传众专利搜索

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发明名称	System for sputtering and method thereof
摘要
申请公布号	KR101107170(B1)	申请公布日期	2012.01.25
申请号	KR20100042117	申请日期	2010.05.04
申请人		发明人
分类号	H01L21/203;H01L21/02;H01L21/20;H01L21/3065	主分类号	H01L21/203
代理机构		代理人
主权项
地址

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