| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. <P>SOLUTION: In an immersion lithographic apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid. <P>COPYRIGHT: (C)2012,JPO&INPIT |
