发明名称 GATE VALVE CLEANING METHOD AND SUBSTRATE PROCESSING SYSTEM
摘要 A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
申请公布号 US2012012254(A1) 申请公布日期 2012.01.19
申请号 US201113243462 申请日期 2011.09.23
申请人 MORIYA TSUYOSHI;NAKAYAMA HIROYUKI;KONDOH KEISUKE;OKA HIROKI;TOKYO ELECTRON LIMITED 发明人 MORIYA TSUYOSHI;NAKAYAMA HIROYUKI;KONDOH KEISUKE;OKA HIROKI
分类号 B08B13/00;C23F1/08 主分类号 B08B13/00
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