发明名称 ELECTRIC FIELD-EFFECT TRANSISTOR
摘要 <p>By forming an opening section (121.1), an insulator (130.1) is formed in at least part of a portion of the upper surface of a first semiconductor layer (110) which does not have a second semiconductor layer (120) formed there-above. A source electrode (S10) is formed in the opening section (121.1) so as to cover the insulator (130.1). The source electrode (S10) is formed so as to touch the interfaces between the first semiconductor layer (110) and the second semiconductor layer (120).</p>
申请公布号 WO2012008141(A1) 申请公布日期 2012.01.19
申请号 WO2011JP03968 申请日期 2011.07.11
申请人 PANASONIC CORPORATION;TANAKA, KENICHIRO;UEDA, TETSUZO 发明人 TANAKA, KENICHIRO;UEDA, TETSUZO
分类号 H01L21/338;H01L21/28;H01L21/283;H01L29/778;H01L29/812 主分类号 H01L21/338
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