发明名称 NONVOLATILE STORAGE DEVICE AND PROCESS FOR PRODUCTION THEREOF
摘要 <p>Provided is a nonvolatile storage device (10) which has a reduced initiation voltage and can have a low driving voltage. The nonvolatile storage device (10) comprises a semiconductor substrate (100), a first electrode layer (105) formed on the semiconductor substrate (100), an oxygen-deficient first tantalum oxide layer (106x) formed on the first electrode layer (105) and having a composition represented by TaOx (0.8 = x = 1.9), a second tantalum oxide layer (106y) formed on the first tantalum oxide layer (106x) and having a composition represented by TaOy (2.1 = y), and a second electrode layer (107) formed on the second tantalum oxide layer (106y), wherein the second tantalum oxide layer (106y) has a columnar structure composed of multiple columnar bodies.</p>
申请公布号 WO2012008160(A1) 申请公布日期 2012.01.19
申请号 WO2011JP04022 申请日期 2011.07.13
申请人 PANASONIC CORPORATION;NINOMIYA, TAKEKI;FUJII, SATORU;HAYAKAWA, YUKIO;MIKAWA, TAKUMI 发明人 NINOMIYA, TAKEKI;FUJII, SATORU;HAYAKAWA, YUKIO;MIKAWA, TAKUMI
分类号 H01L27/105;H01L45/00;H01L49/00 主分类号 H01L27/105
代理机构 代理人
主权项
地址