发明名称 Nitride semiconductor light emitting device, method of manufacturing nitride semiconductor light emitting device, and nitride semiconductor transistor device
摘要 Example embodiments herein relate to a nitride semiconductor light emitting device including a coat film formed at a light emitting portion and including an aluminum nitride crystal or an aluminum oxynitride crystal, and a method of manufacturing the nitride semiconductor light emitting device. Also provided is a nitride semiconductor transistor device including a nitride semiconductor layer and a gate insulating film which is in contact with the nitride semiconductor layer and includes an aluminum nitride crystal or an aluminum oxynitride crystal.
申请公布号 US2012015465(A1) 申请公布日期 2012.01.19
申请号 US201113200357 申请日期 2011.09.23
申请人 KAMIKAWA TAKESHI;KAWAGUCHI YOSHINOBU 发明人 KAMIKAWA TAKESHI;KAWAGUCHI YOSHINOBU
分类号 H01L33/26;H01L21/336;H01L21/338;H01L29/778;H01L29/78;H01L29/812;H01S5/028;H01S5/343 主分类号 H01L33/26
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