| 摘要 |
A lithographic projection apparatus includes a projection system having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid locally covering a portion of the upper surface of the wafer. The last element has a lower surface from which the exposure light is emitted. The last element also has an outer surface which extends upwardly from an edge portion of the lower surface. The apparatus also includes a space along the outer surface of the last element, to which the liquid is supplied from above the lower surface of the last element. The space is defined by the outer surface of the last element and a surface opposing the outer surface of the last element. |
