发明名称 Device responsive to electromagnetic radiation
摘要 <p>A device (1) which is responsive to electromagnetic radiation (2) is described. The device comprises an absorption region (6) for electromagnetic radiation and first and second electrodes (5, 7) providing contacts to the absorption region. The absorption region includes a layer (6 1 ) which comprises an aggregation of patterned conductive structures (10), for example periodic structures such as grating and/or spirals, embedded in a radiation-absorbing matrix (11). The conductive structures are configured to increase radiation absorption by the matrix through surface plasmon generation. The conductive structure can be conveniently formed using a lift-off process.</p>
申请公布号 EP2408036(A1) 申请公布日期 2012.01.18
申请号 EP20100169845 申请日期 2010.07.16
申请人 HITACHI LTD. 发明人 WILLIAMS, DAVID;BROSSARD, FREDERIC
分类号 H01L51/42 主分类号 H01L51/42
代理机构 代理人
主权项
地址