发明名称 Optical element and illumination optics for microlithography
摘要 <p>An optical element serves to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam (26) hitting the optical element. The optical element has a spatial optical structure (16) which generates a first part of the influence exerted on the nominal beam angle when exposed to the radiation beam (26). An optical coating (24) applied on the spatial optical structure or on a carrier layer carrying the spatial optical structure (16) causes a defined attenuation of parts of the radiation beam (26) when exposed to the latter, thus resulting in a second part of the influence exerted on the nominal beam angle. The optical effects of the structure (16) and the coating (24) are such that they complement each other in influencing the nominal beam angle. The manufacturing effort required to obtain this effect is quite low. Moreover, this leads to new possibilities in terms of influencing the nominal beam angle.</p>
申请公布号 EP2407828(A1) 申请公布日期 2012.01.18
申请号 EP20110184955 申请日期 2007.12.20
申请人 CARL ZEISS SMT GMBH 发明人 GERHARD, DR. MICHAEL
分类号 G03F7/20 主分类号 G03F7/20
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