ABLAGERUNGSSYSTEM MIT HOHEM DURCHSATZ FÜR OXIDDÜNNFILM-WACHSTUM DURCH REAKTIVE KOEVAPORATION

摘要

The present invention is directed to an apparatus for generating films on a substrate, the apparatus comprising a deposition chamber and a monitor chamber coupled to the deposition chamber, the monitor chamber being connected to a first source of vacuum and the deposition chamber being connected to a second source of vacuum. Further, the apparatus comprises at least one deposition monitor contained in the monitor chamber and a valve separating an interior of the monitor chamber from the deposition chamber.