发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
申请公布号 US2012008114(A1) 申请公布日期 2012.01.12
申请号 US201113240650 申请日期 2011.09.22
申请人 ASML NETHERLANDS B.V. 发明人 HENNUS PIETER RENAAT MARIA;MERTENS JEROEN JOHANN SOPHIA MARIA;SMULDERS PATRICK JOHANNES CORNELUS HENDRIK;SMITS PETER
分类号 G03B27/52 主分类号 G03B27/52
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