发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
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申请公布号 |
US2012008114(A1) |
申请公布日期 |
2012.01.12 |
申请号 |
US201113240650 |
申请日期 |
2011.09.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HENNUS PIETER RENAAT MARIA;MERTENS JEROEN JOHANN SOPHIA MARIA;SMULDERS PATRICK JOHANNES CORNELUS HENDRIK;SMITS PETER |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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